A Process Variability Band Area Reduction Algorithm For Optical Lithography
Publication Type
Conference Paper
  • Ahmed Awad
  • Atsushi Takahashi
  • Satoshi Tanaka
  • Chikaaki Kodama

As advanced technology nodes are getting smaller and smaller, lithographic process is suspectible to dose and focus variations that would badly impact the lithographic yield. Process variations can be modeled as the area of XOR between two printed mask images obtained by two extreme conditions. This metric is called Process Variability band (PV-band) which can be reduced by proper placement of Sub Resolution Assisting Features (SRAFs) during Optical Proximity Correction (OPC). This paper proposes a PV-band reduction algorithm using SRAFs and polygons shifting.

Conference Title
the 2014 IEICE Society Conference
Conference Country
Conference Date
Sept. 23, 2014 - Sept. 25, 2014
Conference Sponsor